UCSB researchers invented diffusion technique that can successfully synthesize graphene on silicon substrate, paving way for faster, smaller integrated circuits

Briefing

UCSB researchers invented diffusion technique that can successfully synthesize graphene on silicon substrate, paving way for faster, smaller integrated circuits

July 25, 2019

Briefing

  • Diffusion Method – University of California Santa Barbara (UCSB) researchers developed novel solid phase diffusion method for synthesizing multi-layer graphene on silicon substrate
  • How It Works – Graphite powder is deposited onto nickel metal and then heat and pressure are applied so that graphite is broken down and carbon passes through metal film
  • Graphene Interconnects – Paves way to make graphene interconnects, components that connect transistors on microchips, replacing copper as material, which tends to overheat when shrunken to nanoscale
  • Manufacturing Compatible – Because of low temperatures used compared to chemical vapor deposition (CVD), process is compatible with high volume manufacturing of existing complementary metal-oxide-semiconductor (CMOS) transistors
  • Applications – Can create faster, smaller, lighter, more flexible, more reliable, and more cost-effective integrated circuits used in computers and electronic devices
  • Patent and Licensing – University filed for patent for technique and is in talks with industry partners to potentially license technology

Accelerator

Sector

Information Technology

Function

IT Infrastructure, Operations, Manufacturing and Production, Research and Development

Organization

University of California - Santa Barbara

Source

Original Publication Date

July 23, 2019

Leave a comment